The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 31, 2017
Filed:
Jul. 23, 2012
Michael Vergöhl, Cremlingen, DE;
Daniel Rademacher, Braunschweig, DE;
Hans-ulrich Kricheldorf, Bad Harzburg, DE;
Günter Bräuer, Cremlingen, DE;
Michael Vergöhl, Cremlingen, DE;
Daniel Rademacher, Braunschweig, DE;
Hans-Ulrich Kricheldorf, Bad Harzburg, DE;
Günter Bräuer, Cremlingen, DE;
Abstract
The invention relates to methods and devices for producing one or more low-particle layers on substrates in a vacuum. The layers are deposited onto the substrate from a cylindrical source material, optionally together with a reactive gas component, by means of magnetron sputtering. The layer is deposited against the force of gravity in a sputter-up method. During the method or within the device, the structure or stochiometric atomic composition of the layers can optionally be modified using a plasma source. Multiple sputtering sources with different source materials can be provided in the device such that multiple layers of different compositions can be applied on the substrate at a high speed in one process.