San Jose, CA, United States of America

Daniel N Tang



Average Co-Inventor Count = 2.6

ph-index = 8

Forward Citations = 215(Granted Patents)


Company Filing History:


Years Active: 1989-2001

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9 patents (USPTO):

Title: The Innovative Contributions of Daniel N. Tang

Introduction

Daniel N. Tang is a prominent inventor based in San Jose, California. He has made significant contributions to the field of semiconductor fabrication, holding a total of nine patents. His work has been instrumental in advancing technology within the industry.

Latest Patents

Among his latest patents is the "Self-aligned contact process in semiconductor fabrication and device therefrom." This innovation involves the encapsulation of gate stacks of a semiconductor device in an oxide insulative layer and a silicon nitride etch-stop layer. This process allows for the formation of a contact filling that connects to underlying diffusion regions without the risk of accidental diffusion contact to gate shorts created by the contact filling. As a result, gate stacks can be patterned closer together, reducing cell size and increasing cell density. Furthermore, the use of the etch-stop layer simplifies contact lithography, allowing for larger contact openings and less stringent alignment tolerances without compromising cell size or creating diffusion contact to gate shorts.

Career Highlights

Daniel N. Tang is currently employed at Intel Corporation, where he continues to innovate and contribute to the semiconductor industry. His expertise and inventions have positioned him as a key figure in his field.

Collaborations

He has collaborated with notable coworkers such as Gregory E. Atwood and Krishna Kumar Parat, further enhancing the innovative environment at Intel Corporation.

Conclusion

Daniel N. Tang's contributions to semiconductor technology through his patents and work at Intel Corporation highlight his importance as an inventor. His innovative processes are paving the way for advancements in the industry.

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