Company Filing History:
Years Active: 2021-2023
Title: **Innovator Spotlight: Daniel James Bahr**
Introduction
Daniel James Bahr, an inventor based in Portland, Oregon, has made significant contributions to the field of technology with his innovative approaches. With a total of 2 patents to his name, Bahr has been instrumental in advancing methodologies that enhance manufacturing processes in the semiconductor industry.
Latest Patents
Bahr's latest patent focuses on a via contact patterning method designed to increase edge placement error margin during the processing of metallization stacks. This method involves creating a pattern of alternating trench contacts and gates over a support structure. Each trench contact is electrically insulated from its neighboring gate using a dielectric material, or several layers of different dielectric materials. Notably, the gates are recessed in relation to the trench contacts. Additionally, a protective layer comprised of one or more dielectric materials, in conjunction with a sacrificial helmet material, is applied over the trench contacts to safeguard them during the via contact patterning and etch processes. This approach not only enhances efficiency but also increases the margin for edge placement error when forming via contacts.
Career Highlights
Daniel Bahr is currently associated with Intel Corporation, where his work primarily focuses on innovative semiconductor technologies. His expertise in contact patterning and error reduction has proven crucial for improving the robustness of electronic devices.
Collaborations
In his journey, Bahr has collaborated with notable professionals such as Mohit K Haran and Deepak S Rao. These collaborations have amplified his contributions to the field, fostering an environment of creativity and innovation.
Conclusion
Daniel James Bahr continues to be a pioneering figure in the realm of semiconductor innovations. His inventive spirit and commitment to refining manufacturing processes uphold the ongoing evolution of technology. Through his contributions at Intel Corporation, Bahr is setting new benchmarks for excellence in the industry.