Edina, MN, United States of America

Daniel J Fertig


Average Co-Inventor Count = 1.4

ph-index = 2

Forward Citations = 17(Granted Patents)


Company Filing History:


Years Active: 1990-2011

Loading Chart...
4 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Daniel J Fertig

Introduction

Daniel J Fertig is an accomplished inventor based in Edina, Minnesota. With a total of four patents to his name, he has made significant contributions to the field of semiconductor devices and fabrication processes. His inventions focus on enhancing manufacturing efficiency and device performance.

Latest Patents

Fertig's latest patents include a groundbreaking method of fabricating high-voltage metal oxide semiconductor transistor devices. This process utilizes a thicker sacrificial nitride layer, which effectively reduces the time and costs associated with chemical-mechanical polish (CMP) by minimizing topographical variations on the transistor. The method encompasses multiple stages, including the formation of gate oxide and field oxide regions on a substrate, creating a polysilicon layer, and employing a bi-directional epitaxial doping technique. This latter method involves the formation of an epitaxial layer on a substrate, introducing selected impurities, and driving those impurities to create desired doped regions, marking a significant advancement in semiconductor technology.

Career Highlights

Throughout his career, Daniel J Fertig has worked with notable companies such as Agere Systems, Guardian Corporation, and VTC Inc. These positions have provided him with valuable experience and insights into the semiconductor industry, allowing him to develop innovative solutions that align with industry demands.

Collaborations

Fertig has collaborated with a talented group of colleagues, including Joseph J Burkhardt and Jeremy A Schweigert. These partnerships have fostered an environment of creativity and teamwork, contributing to the successful development of new technologies and fabrication methods.

Conclusion

Daniel J Fertig's contributions to the field of semiconductor innovations demonstrate his commitment to advancing technology through inventive solutions. His successful patenting of methods related to high-voltage transistor devices and epitaxial doping techniques showcases his expertise and forward-thinking approach in the ever-evolving landscape of semiconductor manufacturing. As the industry continues to grow, Fertig's work will undoubtedly play a vital role in shaping the future of electronics.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…