Daniel Hu

Title: Innovations by Daniel Hu in Semiconductor Technology

Introduction

Daniel Hu is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on advanced methods for forming double patterned structures, which are crucial for the development of modern semiconductor devices.

Latest Patents

Daniel Hu's latest patents include innovative methods for forming double patterns in semiconductor structures. One of his patents describes a semiconductor structure that includes a double patterned structure and outlines a method for forming it. This involves creating a negative photoresist layer on top of a positive photoresist layer, followed by an exposure process that forms specific regions in both layers. The process includes a negative-tone development to create openings and an etching step to refine the structure further. Another patent details a similar method but starts with a positive photoresist layer on a negative photoresist layer, showcasing his expertise in manipulating photoresist materials for enhanced semiconductor fabrication.

Career Highlights

Daniel Hu is currently employed at Semiconductor Manufacturing International Corporation, a leading company in the semiconductor industry. His work has been instrumental in advancing the techniques used in semiconductor manufacturing, particularly in the area of patterning technologies.

Collaborations

Throughout his career, Daniel has collaborated with notable colleagues such as Ken Wu and Yiming Gu. These partnerships have fostered innovation and have contributed to the successful development of new semiconductor technologies.

Conclusion

Daniel Hu's contributions to semiconductor technology through his innovative patents and collaborations highlight his role as a key figure in the industry. His work continues to influence the advancement of semiconductor manufacturing processes.