Boerne, TX, United States of America

Daniel D Siems


Average Co-Inventor Count = 4.4

ph-index = 2

Forward Citations = 18(Granted Patents)


Company Filing History:


Years Active: 1995-1997

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2 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Daniel D. Siems

Introduction

Daniel D. Siems is a notable inventor based in Boerne, Texas. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on improving the efficiency and quality of semiconductor manufacturing processes.

Latest Patents

One of Siems' latest patents is titled "Wafer Edge Sealing." This invention presents a method and process for reducing edge-related defects in semiconductor wafers. The process involves calibrating multiple process units to ensure they are equally referenced to the edge of the wafer. This calibration allows for precise control of the termination distances of deposited substrate layers, ultimately preventing edge-related defects and increasing semiconductor device yields.

Another significant patent by Siems is "Semiconductor Wafer Defect Monitoring." This invention provides a method and apparatus for detecting specific types of defects, such as chemical stains, on a non-visible surface of a semiconductor wafer. The method utilizes a support substrate with a highly reflecting surface to illuminate and examine the chosen surface for defects, enhancing the monitoring process during semiconductor manufacturing.

Career Highlights

Daniel D. Siems is currently employed at VLSI Technology, Inc., where he continues to innovate in the semiconductor industry. His expertise and inventions have contributed to advancements in manufacturing processes, making him a valuable asset to his company.

Collaborations

Siems has collaborated with notable coworkers, including Judy U. Galloway and Clayton Lantz. Their combined efforts in the field of semiconductor technology have fostered an environment of innovation and progress.

Conclusion

Daniel D. Siems exemplifies the spirit of innovation in the semiconductor industry through his patents and contributions. His work not only addresses critical challenges in manufacturing but also enhances the overall quality of semiconductor devices.

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