This inventor holds 4 USPTO granted patents, plus 2 CIPO patents. Top assignee: Skyworks Solutions, Inc.. Active years: 2011-2013.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2011-2013
Title: The Innovative Contributions of Daniel C. Weaver
Introduction
Daniel C. Weaver is a notable inventor based in Newbury Park, CA (US). He has made significant contributions to the field of semiconductor technology, particularly in the area of metal deposition processes. With a total of 4 patents to his name, Weaver's work has advanced the methods used in semiconductor manufacturing.
Latest Patents
Weaver's latest patents include innovative apparatus and methods for detecting evaporation conditions in evaporators used for depositing metal onto semiconductor wafers, such as GaAs wafers. One of his key inventions features a crystal monitor sensor that detects metal vapor associated with a metal source before deposition occurs. This apparatus includes a shutter that remains closed when the sensor identifies an undesired condition, thereby preventing metal deposition on the semiconductor wafer. The undesired conditions can relate to various factors, including the composition and deposition rate of the metal source, as well as the position and intensity of the electron beam.
Another significant patent involves methods of evaporating metal onto semiconductor wafers using a test wafer holder. This apparatus consists of an evaporation chamber with a wafer holder and a separate test wafer holder. The design allows for the simultaneous evaporation of metal onto production wafers while conducting quality assessments on a test wafer. This dual approach is particularly beneficial for ensuring the quality of GaAs production wafers.
Career Highlights
Daniel C. Weaver is currently employed at Skyworks Solutions, Inc., where he continues to innovate in the semiconductor field. His work has been instrumental in enhancing the efficiency and reliability of metal deposition processes, which are critical in semiconductor manufacturing.
Collaborations
Weaver has collaborated with notable colleagues, including Lam T. Luu and Richard S. Bingle, contributing to a dynamic and innovative work environment.
Conclusion
Daniel C. Weaver's contributions to semiconductor technology through his patents and collaborative efforts have significantly impacted the industry. His innovative approaches to metal deposition processes continue to shape the future of semiconductor manufacturing.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
