The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 20, 2011
Filed:
Oct. 05, 2010
Lam T. Luu, Moorpark, CA (US);
Shiban K. Tiku, Camarillo, CA (US);
Richard S. Bingle, Thousand Oaks, CA (US);
Jens A. Riege, Ojai, CA (US);
Heather L. Knoedler, Newbury Park, CA (US);
Daniel C. Weaver, Newbury Park, CA (US);
Lam T. Luu, Moorpark, CA (US);
Shiban K. Tiku, Camarillo, CA (US);
Richard S. Bingle, Thousand Oaks, CA (US);
Jens A. Riege, Ojai, CA (US);
Heather L. Knoedler, Newbury Park, CA (US);
Daniel C. Weaver, Newbury Park, CA (US);
Skyworks Solutions, Inc., Woburn, MA (US);
Abstract
Apparatus and methods for evaporating metal onto semiconductor wafers are disclosed. One such apparatus can include an evaporation chamber that includes a wafer holder, such as a dome, and a test wafer holder that is separate and spaced apart from the wafer holder. In certain implementations, the test wafer can be coupled to a cross beam supporting at least one shaper. A metal can be evaporated onto production wafers positioned in the wafer holder while metal is evaporated on a test wafer positioned in a test wafer holder. In some instances, the production wafers can be GaAs wafers. The test wafer can be used to make a quality assessment about the production wafers.