The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 04, 2011
Filed:
Oct. 05, 2010
Lam T. Luu, Moorpark, CA (US);
Heather L. Knoedler, Newbury Park, CA (US);
Richard S. Bingle, Thousand Oaks, CA (US);
Daniel C. Weaver, Newbury Park, CA (US);
Lam T. Luu, Moorpark, CA (US);
Heather L. Knoedler, Newbury Park, CA (US);
Richard S. Bingle, Thousand Oaks, CA (US);
Daniel C. Weaver, Newbury Park, CA (US);
Skyworks Solutions, Inc., Woburn, MA (US);
Abstract
Apparatus and methods for detecting evaporation conditions in an evaporator for evaporating metal onto semiconductor wafers, such as GaAs wafers, are disclosed. One such apparatus can include a crystal monitor sensor configured to detect metal vapor associated with a metal source prior to metal deposition onto a semiconductor wafer. This apparatus can also include a shutter configured to remain in a closed position when the crystal monitor sensor detects an undesired condition, so as to prevent metal deposition onto the semiconductor wafer. In some implementations, the undesired condition can be indicative of a composition of a metal source, a deposition rate of a metal source, impurities of a metal source, position of a metal source, position of an electron beam, and/or intensity of an electron beam.