Daniel C Hu

Title: The Innovations of Daniel C. Hu

Introduction

Daniel C. Hu is a notable inventor based in San Jose, California. He has made significant contributions to the field of semiconductor technology. His work primarily focuses on the development of advanced transistor structures.

Latest Patents

Daniel C. Hu holds a patent for a complementary insulated gate field effect transistor structure. This innovative design features complementary p-channel and n-channel devices integrated within the same semiconductor substrate. The patent outlines a process for fabricating this structure, which includes oxide isolation of the active device regions, counterdoping of the p-well with impurities of the opposite type to achieve a composite doping profile, and several other advanced techniques aimed at enhancing device performance.

Career Highlights

Daniel is currently employed at Fairchild Camera and Instrument Corporation, where he continues to push the boundaries of semiconductor technology. His work has been instrumental in advancing the efficiency and effectiveness of transistor designs.

Collaborations

One of his notable collaborators is Bruce E. Deal, with whom he has worked closely on various projects. Their combined expertise has led to significant advancements in the field.

Conclusion

Daniel C. Hu's contributions to semiconductor technology through his innovative patents and collaborations highlight his importance in the industry. His work continues to influence the development of advanced electronic devices.