Shakopee, MN, United States of America

Dan Yu

This inventor holds 6 USPTO granted patents. Top assignee: Seagate Technology Incorporated. Active years: 2016-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dan Yu. Retrieved from https://idiyas.com/inventor/dan-yu-m8wbarfm

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 33.3

Average Co-Inventor Count = 2.8

ph-index = 2

Forward Citations = 43(Granted Patents)


Company Filing History:


Years Active: 2016-2023

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6 patents (USPTO):Explore Patents

Title: The Innovations of Dan Yu

Introduction

Dan Yu is an accomplished inventor based in Shakopee, MN (US). He has made significant contributions to the field of technology, particularly in the area of phase-shifting masks. With a total of 6 patents to his name, Dan has established himself as a key figure in innovation.

Latest Patents

One of Dan's latest patents is the Alternating Phase Shift Mask. This invention comprises a 0° phase portion with a first width and a 180° phase portion with a second width that is greater than the first. The differences between the widths of the 180° phase portion and the 0° phase portion can be 10 nm, 15 nm, or 20 nm. An Alt-PSM with phase portions of varying widths can produce an aerial image intensity transmission graph that is symmetric, particularly at an intensity of 0.2-0.3.

Career Highlights

Dan Yu is currently employed at Seagate Technology Incorporated, where he continues to push the boundaries of innovation. His work has been instrumental in advancing technologies that are crucial for modern applications.

Collaborations

Dan has collaborated with notable coworkers, including Aaron Michael Bowser and Yi Liu, who contribute to the innovative environment at Seagate Technology.

Conclusion

Dan Yu's contributions to technology through his patents and collaborations highlight his role as a significant inventor in the field. His work continues to influence advancements in phase-shifting mask technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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