The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 17, 2016

Filed:

Oct. 30, 2014
Applicant:

Seagate Technology Llc, Cupertino, CA (US);

Inventors:

Dan Yu, Shakopee, MN (US);

Aaron Bowser, St. Paul, MN (US);

Yi Liu, Edina, MN (US);

Assignee:

SEAGATE TECHNOLOGY LLC, Cupertino, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/30 (2012.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 1/30 (2013.01); G03F 7/20 (2013.01);
Abstract

Implementations described and claimed herein include photolithography technology to alleviate the imbalance of transmission intensity induced. In one implementation, a method comprises exposing an alternating phase shift mask (Alt-PSM) and a trim mask, wherein an exposure placement of the trim mask is shifted relative to an exposure placement of the Alt-PSM.


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