Seagate Technology Incorporated

Dan Yu

Aaron Michael Bowser

Yi Liu

XiaoHong Zhang

An alternating phase-shifting mask (Alt-PSM) comprising a 0&#xb0; phase portion having a first width and a 180&#xb0; phase portion having a second width greater than the first width. Example differences between the width of the 180&#xb0; phase portion and the 0&#xb0; phase portion may be 10 nm, 15 nm, or 20 nm. An Alt-PSM having phase portions of different widths can have an aerial image intensity transmission graph that is symmetric, for example, at 0.2-0.3 intensity.

Alternating phase shift mask

Implementations disclosed herein provide a method of reducing the topography at the alignment and overlay marks area during the writer pole photolithography process in order to reduce the wafer scale variation and reduce the writer pole photolithography process rework rate. In one implementation, an intermediate stage of a wafer for writer pole formation is generated by removing a part of at least one metallic writer pole layer on top of an intermediate stage writer pole wafer to form a recovery trench, depositing an optically transparent material on top of the wafer, wherein the thickness of the optically transparent material is higher than a target recovery trench topography, forming a photoresist pattern on top of the optically transparent material over the recovery trench, etching the optically transparent material, and removing the photoresist pattern and at least part of the remaining optically transparent material.

Writer pole formation

Implementations described and claimed herein include photolithography technology to alleviate the imbalance of transmission intensity induced. In one implementation, a method comprises exposing an alternating phase shift mask (Alt-PSM) and a trim mask, wherein an exposure placement of the trim mask is shifted relative to an exposure placement of the Alt-PSM.

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Shakopee, MN, United States of America

Dan Yu