Herzliya, Israel

Dan Grossman

This inventor holds 2 USPTO granted patents. Top assignee: Applied Materials Israel Limited. Active years: 2010-2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dan Grossman. Retrieved from https://idiyas.com/inventor/dan-grossman-rezvatnc

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 50.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2010-2011

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2 patents (USPTO):Explore Patents

Title: Dan Grossman: Innovator in High-Resolution Wafer Inspection Technology

Introduction

Dan Grossman is a notable inventor based in Herzliya, Israel. He has made significant contributions to the field of optical systems, particularly in the area of wafer inspection technology. With a total of 2 patents, Grossman has demonstrated his expertise and innovative spirit in developing advanced methods for material inspection.

Latest Patents

One of Grossman's latest patents is a high-resolution wafer inspection system. This method involves irradiating a region using an optical system with a pump beam at a specific pump wavelength. A probe beam at a probe wavelength also irradiates the region, generating returning probe beam radiation. The beams are scanned across the region at a defined scan rate. A detector captures the returning probe radiation and forms an image of the region, achieving a resolution that surpasses the pump and probe Abbe limits of the optical system. The roles of the pump and probe beams can be alternated, and the modulation frequency of the pump beam can be adjusted to extract more information. This innovative approach allows for differentiation between various materials present in the region.

Career Highlights

Dan Grossman is currently employed at Applied Materials Israel Limited, where he continues to push the boundaries of technology in his field. His work has been instrumental in enhancing the capabilities of wafer inspection systems, making them more efficient and effective.

Collaborations

Throughout his career, Grossman has collaborated with talented individuals such as Moshe Langer and Roman Kris. These partnerships have contributed to the development of cutting-edge technologies and have fostered a collaborative environment for innovation.

Conclusion

Dan Grossman is a prominent figure in the realm of optical systems and wafer inspection technology. His innovative patents and contributions to Applied Materials Israel Limited highlight his commitment to advancing the field. His work continues to inspire future innovations in material inspection methods.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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