Mountain View, CA, United States of America

Dan Engelhard


Average Co-Inventor Count = 4.0

ph-index = 3

Forward Citations = 44(Granted Patents)


Company Filing History:


Years Active: 2006-2008

Loading Chart...
3 patents (USPTO):Explore Patents

Title: Dan Engelhard: Innovator in Optical Metrology

Introduction

Dan Engelhard is a notable inventor based in Mountain View, CA (US). He has made significant contributions to the field of optical metrology, holding a total of 3 patents. His work focuses on optimizing process control through innovative measurement techniques.

Latest Patents

Engelhard's latest patents include advancements in optical metrology model optimization for process control. The first patent outlines a method to evaluate the adequacy of a profile model by selecting an initial profile model that includes parameters to be measured. Measurements are obtained using two different metrology tools, and statistical metric criteria are calculated based on these measurements. If the criteria do not meet matching requirements, the profile model is revised. Conversely, if the criteria are satisfied, the model is stored for future use. The second patent further refines this process by selecting acceptable ranges for profile model parameters and setting statistical metric criteria that define acceptable variations in measurements. This systematic approach ensures the reliability of the profile model in controlling fabrication processes.

Career Highlights

Throughout his career, Engelhard has worked with prominent companies such as Timbre Technologies, Inc. and Tokyo Electron Limited. His experience in these organizations has allowed him to develop and refine his expertise in optical metrology and process control.

Collaborations

Engelhard has collaborated with talented individuals in his field, including Jason Ferns and Lawrence Lane. These partnerships have contributed to the advancement of his innovative projects and patents.

Conclusion

Dan Engelhard is a distinguished inventor whose work in optical metrology has led to significant advancements in process control. His contributions continue to influence the industry and pave the way for future innovations.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…