The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 01, 2008
Filed:
May. 21, 2007
Daniel Prager, Hopewell Junction, NY (US);
Jason Ferns, Sunnyvale, CA (US);
Lawrence Lane, San Jose, CA (US);
Dan Engelhard, Mountain View, CA (US);
Daniel Prager, Hopewell Junction, NY (US);
Jason Ferns, Sunnyvale, CA (US);
Lawrence Lane, San Jose, CA (US);
Dan Engelhard, Mountain View, CA (US);
Timbre Technologies, Inc., Santa Clara, CA (US);
Abstract
To evaluate the adequacy of a profile model, an initial profile model is selected. The profile model includes profile model parameters to be measured in implementing types of process control to be used in controlling a fabrication process. A measurement of profile model parameters is obtained using a first metrology tool and the profile model. A measurement of the profile model parameters is obtained using a second metrology tool and the profile model. Statistical metric criteria are calculated based on the measurements of the profile model parameters obtained using the first and second metrology tools. When the calculated statistical metric criteria are not within matching requirements, the profile model is revised. When the calculated statistical metric criteria are within matching requirements, the profile model or the revised profile model is stored.