This inventor holds 2 USPTO granted patents. Top assignee: Synopsys, Inc.. Active years: 2007.
Company Filing History:
Years Active: 2007
Title: Dan Beale - Innovator in Optical Proximity Correction
Introduction
Dan Beale is a notable inventor based in Portland, OR (US), recognized for his contributions to the field of optical proximity correction (OPC) in integrated circuit design. With a total of 2 patents, Beale has made significant advancements that enhance the precision of etching processes in semiconductor manufacturing.
Latest Patents
Beale's latest patents include innovative systems for calculating etch proximity-correction using both object-precision and image-precision techniques. The first patent outlines a system that calculates etch proximity-correction during the OPC process by selecting a target point on an edge in the layout of an integrated circuit. The system creates a list of edges within the ambit of the target point and computes a line integral of a statistical function over the remaining edges to model etch proximity effects. The calculated etch proximity-correction is then applied to an area near the target point. The second patent similarly focuses on calculating etch proximity-correction but employs a different approach by casting rays from the target point and constructing pie-wedges to compute a surface integral of a statistical function, which models the etch bias at the target point.
Career Highlights
Dan Beale is currently employed at Synopsys, Inc., a leading company in electronic design automation. His work at Synopsys has positioned him as a key player in the development of advanced technologies that improve the efficiency and accuracy of semiconductor manufacturing processes.
Collaborations
Throughout his career, Beale has collaborated with several talented individuals, including John P Stirniman and Jim Shiely. These collaborations have contributed to the innovative solutions he has developed in the field of optical proximity correction.
Conclusion
Dan Beale's contributions to the field of optical proximity correction through his patents and work at Synopsys, Inc. highlight his role as an influential inventor in the semiconductor industry. His innovative approaches continue to shape the future of integrated circuit design.