The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2007
Filed:
Sep. 29, 2004
Dan Beale, Portland, OR (US);
Jim Shiely, Aloha, OR (US);
John Stirniman, Vancouver, WA (US);
Synopsys, Inc., Mountain View, CA (US);
Abstract
One embodiment of the present invention provides a system that calculates etch proximity-correction during an OPC (Optical Proximity Correction) process. During operation, the system receives a layout for an integrated circuit. Next, the system selects a target point on an edge in the layout. The system then casts a plurality of rays from the target point, and constructs a plurality of pie-wedges based on the cast rays. The system then computes a surface integral of a statistical function over the pie-wedges, wherein the surface integral of the statistical function models the etch bias at the target point. Next, the calculated etch proximity-correction is applied to an area in proximity to the target point.