Dali Liu

Title: Dali Liu - Innovator in Semiconductor Technology

Introduction

Dali Liu is a prominent inventor based in Yongin-si, South Korea. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approaches.

Latest Patents

His latest patents include an etching method using a remote plasma source and a method of fabricating a semiconductor device that incorporates this etching method. The etching method involves generating plasma by supplying a process gas to at least one remote plasma source (RPS) and applying power to it. This process allows for the etching of a first material film, including SiNx, by supplying the plasma along with at least one control gas selected from HBr, HCl, HI, NH, SiH, CHF, and CHF to a process chamber. Additionally, he has developed a wafer clamping apparatus that features a plurality of support pins under a wafer and a side clamp that directly contacts the lateral side of the wafer to provide necessary support and pressure.

Career Highlights

Dali Liu is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of semiconductor technology. His work has been instrumental in advancing the efficiency and effectiveness of semiconductor fabrication processes.

Collaborations

He collaborates with notable colleagues, including Xinglong Chen and Sung-ho Jang, who contribute to his innovative projects and research endeavors.

Conclusion

Dali Liu's contributions to semiconductor technology through his patents and work at Samsung Electronics Co., Ltd. highlight his role as a key innovator in the field. His advancements in etching methods and wafer clamping apparatuses are paving the way for future developments in semiconductor manufacturing.