Daisuke Urayama

Title: Daisuke Urayama: Innovator in Substrate Processing Technology

Introduction

Daisuke Urayama is a prominent inventor based in Miyagi, Japan. He has made significant contributions to the field of substrate processing, holding a total of 3 patents. His work focuses on developing advanced technologies that enhance the efficiency and effectiveness of substrate processing methods.

Latest Patents

Urayama's latest patents include a substrate processing apparatus and a substrate processing method. The substrate processing apparatus is designed to process reaction products deposited during the etching of a target film. This apparatus features a processing chamber, a partition plate, a plasma source, and a mounting table. The partition plate divides the chamber into a plasma generating space and a substrate processing space, effectively suppressing the permeation of ions and vacuum ultraviolet rays. The plasma source generates plasma in the designated space, while the mounting table supports the target object during processing.

Additionally, Urayama has developed a method for etching a copper layer. This method involves a sequence of steps that include generating plasma from various gases within a processing container. The first gas is a hydrocarbon gas, the second gas is either a rare gas or a mixture of a rare gas and hydrogen, and the third gas is hydrogen. This innovative approach allows for precise etching of the copper layer included in a wafer.

Career Highlights

Daisuke Urayama is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing industry. His work at the company has positioned him as a key player in the development of substrate processing technologies.

Collaborations

Urayama collaborates with talented individuals such as Eiichi Nishimura and Fumiko Yamashita. Their combined expertise contributes to the advancement of innovative solutions in substrate processing.

Conclusion

Daisuke Urayama's contributions to substrate processing technology demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the complexities involved in etching processes, making him a valuable asset in the field.