Miyagi, Japan

Daisuke Shirasawa

This inventor holds 1 USPTO granted patent and 3 published patent applications. Top assignee: Tokyo Electron Limited. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Daisuke Shirasawa. Retrieved from https://idiyas.com/inventor/daisuke-shirasawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Daisuke Shirasawa: Innovator in Cleaning Technology

Introduction

Daisuke Shirasawa is a notable inventor based in Miyagi, Japan. He has made significant contributions to the field of cleaning technology, particularly through his innovative methods that enhance the efficiency of cleaning processes.

Latest Patents

Shirasawa holds a patent for a "Cleaning method and recording medium for recording cleaning program." This method addresses the cleaning of by-products that include refractory materials or metal compounds. The process involves two main stages: a reforming process and an etching process. In the reforming stage, the surface of the by-product is treated using nitrogen-containing gas and hydrogen-containing gas. The subsequent etching process utilizes halogen-containing gas and inert gas to achieve the desired cleaning effect.

Career Highlights

Daisuke Shirasawa is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His work at this organization has allowed him to develop and refine his innovative cleaning methods, contributing to advancements in technology.

Collaborations

Shirasawa collaborates with Naoki Sato, a fellow innovator in the field. Their partnership has fostered a creative environment that encourages the development of new ideas and technologies.

Conclusion

Daisuke Shirasawa's contributions to cleaning technology through his patented methods demonstrate his commitment to innovation. His work at Tokyo Electron Limited and collaboration with Naoki Sato further highlight his impact in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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