The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 20, 2022
Filed:
Sep. 10, 2020
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Daisuke Shirasawa, Miyagi, JP;
Naoki Sato, Miyagi, JP;
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23F 1/12 (2006.01); C23F 1/46 (2006.01); C23C 16/44 (2006.01);
U.S. Cl.
CPC ...
C23F 1/12 (2013.01); C23C 16/4405 (2013.01); C23F 1/46 (2013.01);
Abstract
A cleaning method for a by-product including a refractory material or a metal compound includes a reforming process and an etching process. In the reforming process, a surface of the by-product is reformed using nitrogen-containing gas and hydrogen-containing gas. In the etching process, the reformed surface is etched using halogen-containing gas and inert gas.
Shirasawa, Daisuke. (2022). Cleaning method and recording medium for recording cleaning program (U.S. Patent No. 11530486). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11530486
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile