Nirasaki City, Japan

Daisuke Oba

This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Electron Limited. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Daisuke Oba. Retrieved from https://idiyas.com/inventor/daisuke-oba-j147bef1

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Daisuke Oba: Innovator in Insulating Film Technology

Introduction

Daisuke Oba is a notable inventor based in Nirasaki City, Japan. He has made significant contributions to the field of substrate processing systems, particularly in the formation of insulating films. His innovative approach has garnered attention in the industry.

Latest Patents

Daisuke Oba holds a patent for a "Method for forming insulating film." This method involves supplying a precursor gas to a substrate to generate a fluidic oligomer through plasma polymerization. The fluidic oligomer is then deposited on the substrate, followed by a plasma process that ensures at least part of the oligomer is hydrogen-terminated while maintaining its fluidity. An annealing process, which includes a plasma treatment, is subsequently performed to form the insulating film. This patent showcases his expertise and innovative thinking in material processing.

Career Highlights

Daisuke Oba is currently associated with Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His work at Tokyo Electron Limited has allowed him to apply his innovative methods in real-world applications, contributing to advancements in technology.

Collaborations

Due to space constraints, the details of Daisuke Oba's collaborations will not be included.

Conclusion

Daisuke Oba's contributions to the field of insulating film technology highlight his innovative spirit and dedication to advancing material processing techniques. His patent and work at Tokyo Electron Limited reflect his significant role in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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