Hitachinaka, Japan

Daisuke Muto

This inventor holds 2 USPTO granted patents. Top assignee: Hitachi-High-Technologies Corporation. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Daisuke Muto. Retrieved from https://idiyas.com/inventor/daisuke-muto-w87y3n3z

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.1

ph-index = 1

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2014

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2 patents (USPTO):Explore Patents

Title: Daisuke Muto: Innovator in Charged Particle Technology

Introduction

Daisuke Muto is a prominent inventor based in Hitachinaka, Japan. He has made significant contributions to the field of charged particle technology, holding 2 patents that showcase his innovative spirit and technical expertise.

Latest Patents

Muto's latest patents include a charged particle radiation device and a soundproof cover. The charged particle radiation device features a sample chamber designed to mount a sample, along with a charged particle radiation irradiation section that allows for the observation and fabrication of the sample. The device is equipped with sidewalls, a ceiling board, and a sound-absorbing structure that enhances its functionality. The soundproof cover incorporates these elements to minimize noise interference during operation. Additionally, he has developed charged particle beam apparatus arrangements that utilize specialized noise absorbers to improve performance by targeting specific frequency ranges.

Career Highlights

Daisuke Muto is currently employed at Hitachi High-Technologies Corporation, where he continues to push the boundaries of technology in his field. His work has been instrumental in advancing the capabilities of charged particle devices, making them more efficient and effective for various applications.

Collaborations

Muto has collaborated with notable colleagues such as Masanori Watanabe and Masaru Matsushima. Their combined expertise has contributed to the successful development of innovative technologies in charged particle applications.

Conclusion

Daisuke Muto's contributions to charged particle technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in technology and research.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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