Daisuke Komada

Title: Daisuke Komada: Innovator in Semiconductor Technology

Introduction

Daisuke Komada is a prominent inventor based in Kasugai, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 7 patents. His work focuses on enhancing the reliability and efficiency of semiconductor devices.

Latest Patents

One of his latest patents is for a semiconductor device with dual damascene wiring. This invention features an underlie with a conductive region, an insulating etch stopper film, and an interlayer insulating film. The design includes a wiring trench and a contact hole that extends to the conductive region, ensuring high reliability and low wiring capacitance. Another notable patent involves a manufacturing method for a semiconductor device that utilizes a silicon-containing insulating film. This method employs a mask pattern for dry-etching, achieving a high etching selection ratio between the layers.

Career Highlights

Daisuke Komada has worked with notable companies such as Fujitsu Corporation and Fujitsu VLSI Limited. His experience in these organizations has allowed him to develop innovative solutions in semiconductor technology.

Collaborations

Throughout his career, Daisuke has collaborated with esteemed colleagues, including Kenichi Watanabe and Fumihiko Shimpuku. These partnerships have contributed to the advancement of his research and inventions.

Conclusion

Daisuke Komada's contributions to semiconductor technology are noteworthy, with several patents that enhance device reliability and efficiency. His work continues to influence the field and inspire future innovations.