Tokyo, Japan

Daisuke Koga


 

Average Co-Inventor Count = 6.5

ph-index = 6

Forward Citations = 115(Granted Patents)


Location History:

  • Tokyo, JP (2002 - 2009)
  • Kanagawa, JP (2006 - 2010)

Company Filing History:


Years Active: 2002-2010

Loading Chart...
Loading Chart...
8 patents (USPTO):Explore Patents

Title: Daisuke Koga: Innovator in Substrate Delivery and Polishing Technologies

Introduction

Daisuke Koga is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor manufacturing through his innovative designs and technologies. With a total of 8 patents to his name, Koga has established himself as a key figure in the industry.

Latest Patents

Koga's latest patents include a substrate delivery mechanism and a polishing apparatus. The substrate delivery mechanism features a top ring, a substrate loader, and a pusher mechanism. This design allows for the efficient loading and detachment of substrates while maintaining a sealed environment. The polishing apparatus is designed for achieving a flat mirror finish on workpieces, such as semiconductor wafers. It includes a turntable, a top ring for holding the workpiece, and multiple cleaning apparatuses to ensure the polished workpieces are maintained in optimal condition.

Career Highlights

Throughout his career, Daisuke Koga has worked with notable companies, including Ebara Corporation and Swing Corporation. His experience in these organizations has allowed him to refine his skills and contribute to advancements in semiconductor technology.

Collaborations

Koga has collaborated with talented individuals in the field, including Satoshi Wakabayashi and Kunihiko Sakurai. These partnerships have fostered innovation and have led to the development of cutting-edge technologies.

Conclusion

Daisuke Koga's work in substrate delivery and polishing technologies has made a lasting impact on the semiconductor industry. His innovative patents and collaborations highlight his dedication to advancing technology in this critical field.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…