Location History:
- Utsunomiya, JP (2016)
- Tokyo, JP (2018)
Company Filing History:
Years Active: 2016-2018
Title: Daisuke Iwase: Innovator in Lithography Technology
Introduction
Daisuke Iwase is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of lithography, particularly in the development of advanced manufacturing techniques. With a total of 2 patents to his name, Iwase continues to push the boundaries of innovation in his industry.
Latest Patents
Iwase's latest patents include a lithography apparatus and a method of manufacturing an article. The lithography apparatus is designed to form a pattern on a substrate and includes a base, a movable stage, a patterning device, and a chamber that houses these components. This innovative apparatus is equipped with a detector to obtain information about the relative positions between the patterning device and the base, ensuring precise control during the manufacturing process. His second patent focuses on a processing apparatus that conducts prescribed processing in a specific environment, featuring a chamber with an aperture and a mechanism that allows for relative rotation, enhancing the efficiency of the manufacturing process.
Career Highlights
Daisuke Iwase is currently employed at Canon Kabushiki Kaisha, a leading company in imaging and printing technologies. His work at Canon has allowed him to collaborate with other talented professionals in the field, further advancing the company's innovative capabilities.
Collaborations
One of his notable coworkers is Nobushige Korenaga, with whom he has likely shared insights and expertise in their respective areas of research and development.
Conclusion
Daisuke Iwase's contributions to lithography technology exemplify the spirit of innovation that drives progress in manufacturing. His patents reflect a commitment to enhancing the efficiency and precision of production processes.