The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2018
Filed:
Apr. 29, 2015
Canon Kabushiki Kaisha, Tokyo, JP;
Daisuke Iwase, Tokyo, JP;
Nobushige Korenaga, Utsunomiya, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
The present invention provides a lithography apparatus that forms a pattern on a substrate, the apparatus comprising a base, a stage configured to hold the substrate and be movable above the base with the stage supported by the base, a patterning device configured to perform patterning on the substrate held by the stage, a chamber housing the base and the stage, and supporting the patterning device, a detector configured to obtain information of relative positions between the patterning device and the base, a driving device configured to move the base, and a controller configured to control the driving device based on the information obtained by the detector such that the relative positions satisfy a predetermined condition.