Canon Kabushiki Kaisha

Daisuke Iwase

Nobushige Korenaga

The present invention provides a lithography apparatus that forms a pattern on a substrate, the apparatus comprising a base, a stage configured to hold the substrate and be movable above the base with the stage supported by the base, a patterning device configured to perform patterning on the substrate held by the stage, a chamber housing the base and the stage, and supporting the patterning device, a detector configured to obtain information of relative positions between the patterning device and the base, a driving device configured to move the base, and a controller configured to control the driving device based on the information obtained by the detector such that the relative positions satisfy a predetermined condition.

Lithography apparatus, and method of manufacturing an article

A processing apparatus configured to conduct a prescribed processing on an object to be processed in a specific environment, the processing apparatus comprising: a chamber configured to have an aperture and an interior accommodated to a specific environment; a mechanism of which at least a portion is contained within the chamber interior, while a remaining portion passes through the aperture without contacting the chamber; at least one support member configured to support the mechanism; a sealing member that configures a boundary of the specific environment and an atmospheric environment by connecting one end to the aperture and connecting the other end to the support member; and a rotary member configured to allow relative rotation around a vertical axis between the support member and a structure that supports the support member.

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Tokyo, Japan

Daisuke Iwase