The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 12, 2016

Filed:

Oct. 04, 2013
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Daisuke Iwase, Utsunomiya, JP;

Nobushige Korenaga, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61N 5/00 (2006.01); F16M 13/00 (2006.01); G03B 27/32 (2006.01); G03B 27/52 (2006.01); G03F 7/26 (2006.01); B23Q 3/02 (2006.01); G21K 5/08 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/26 (2013.01); B23Q 3/02 (2013.01); G03F 7/709 (2013.01); G03F 7/70833 (2013.01); G03F 7/70841 (2013.01); G21K 5/08 (2013.01);
Abstract

A processing apparatus configured to conduct a prescribed processing on an object to be processed in a specific environment, the processing apparatus comprising: a chamber configured to have an aperture and an interior accommodated to a specific environment; a mechanism of which at least a portion is contained within the chamber interior, while a remaining portion passes through the aperture without contacting the chamber; at least one support member configured to support the mechanism; a sealing member that configures a boundary of the specific environment and an atmospheric environment by connecting one end to the aperture and connecting the other end to the support member; and a rotary member configured to allow relative rotation around a vertical axis between the support member and a structure that supports the support member.


Find Patent Forward Citations

Loading…