Daisuke Ito

Title: Daisuke Ito: Innovator in Microelectronic Etching Technologies

Introduction

Daisuke Ito is a prominent inventor based in Hillsboro, Oregon, known for his significant contributions to the field of microelectronics. With a total of three patents to his name, he has developed innovative methods that enhance the etching processes used in semiconductor manufacturing.

Latest Patents

Daisuke's latest patents include a method for gas phase etching with controllable etch selectivity of metals. This method describes a process for the dry removal of materials on a microelectronic workpiece. It involves receiving a substrate with a working surface that exposes a metal layer and at least one other material. The process differentially etches the metal layer relative to the other material by exposing the substrate to a controlled gas-phase environment containing an anhydrous halogen compound.

Another notable patent is for a non-plasma etch of titanium-containing material layers with tunable selectivity to alternate metals and dielectrics. This invention provides a non-plasma etch, such as a gas-phase or remote plasma etch, of titanium-containing material layers. The substrate is received within a process chamber, where the exposed material layers include a titanium-containing material layer and at least one additional material layer. The additional material layer is selectively etched with respect to the titanium-containing material layer by exposing the substrate to a controlled environment that includes a halogen-containing gas.

Career Highlights

Daisuke Ito works at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work focuses on advancing etching technologies that are crucial for the production of microelectronic devices. His innovative approaches have positioned him as a key figure in the field.

Collaborations

Daisuke collaborates with talented coworkers, including Subhadeep Kal and Aelan Mosden. Their combined expertise contributes to the development of cutting-edge technologies in microelectronics.

Conclusion

Daisuke Ito's contributions to microelectronic etching technologies demonstrate his innovative spirit and commitment to advancing the semiconductor industry. His patents reflect a deep understanding of the complexities involved in material processing, making him a valuable asset to his field.