The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 16, 2021
Filed:
Jun. 10, 2019
Tokyo Electron Limited, Tokyo, JP;
Subhadeep Kal, Albany, NY (US);
Masashi Matsumoto, Hillsboro, OR (US);
Daisuke Ito, Hillsboro, OR (US);
Yusuke Muraki, Hilsboro, OR (US);
Aelan Mosden, Poughkeepsie, NY (US);
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A method for the dry removal of a material on a microelectronic workpiece is described. The method includes receiving a substrate having a working surface exposing a silicon-germanium alloy and at least one other material, the silicon-germanium alloy represented as SiGe, wherein x is a real number ranging from 0 to 1; and selectively etching the silicon-germanium alloy relative to the other material by exposing the substrate to a controlled gas-phase environment containing an anhydrous halogen compound, such as a diatomic halogen or an interhalogen compound.