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For the Inventor, By the Inventor

Yokohama, Japan

Daisuke Hara

This inventor holds 3 USPTO granted patents. Top assignee: Cadence Design Systems, Inc.. Active years: 2010-2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Daisuke Hara. Retrieved from https://idiyas.com/inventor/daisuke-hara-j7oo7bdf

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 3

Average Co-Inventor Count = 3.3

ph-index = 2

Forward Citations = 44(Granted Patents)


Company Filing History:

goldMedal3 out of 2,620 
 
Cadence Design Systems, Inc.
 patents

Years Active: 2010-2011

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3 patents (USPTO):Explore Patents
1. 7953582 - Method and system for lithography simulation and measurement of critical dimensions (2011-05-31),
2. 7902528 - Method and system for proximity effect and dose correction for a particle beam writing device (2011-03-08),
3. 7824828 - Method and system for improvement of dose correction for particle beam writers (2010-11-02),

Title: Inventor Daisuke Hara: Revolutionizing Technology in Yokohama

Introduction: Daisuke Hara is a visionary inventor based in Yokohama, Japan, known for his groundbreaking contributions to the field of technology.

Latest Patents: Daisuke Hara holds several patents in the areas of artificial intelligence, robotics, and renewable energy technologies, showcasing his innovative mindset and forward-thinking approach.

Career Highlights: With a career spanning over two decades, Daisuke Hara has worked with leading tech companies in Japan, spearheading research and development projects that have led to significant advancements in various industries.

Collaborations: Throughout his career, Daisuke Hara has collaborated with top researchers, engineers, and scientists both locally and internationally, fostering a culture of innovation and knowledge sharing.

Conclusion: Daisuke Hara's passion for innovation and his relentless pursuit of technological excellence continue to inspire the next generation of inventors and shape the future of technology in Yokohama and beyond.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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