Shizuoka-ken, Japan

Daisuke Arioka

USPTO Granted Patents = 5 


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Location History:

  • Ashigarakami-gun, JP (2013)
  • Shizuoka, JP (2014)
  • Shizuoka-ken, JP (2004 - 2016)

Company Filing History:


Years Active: 2004-2016

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5 patents (USPTO):Explore Patents

Title: Daisuke Arioka: Innovator in Polymerizable Compositions

Introduction

Daisuke Arioka is a notable inventor based in Shizuoka-ken, Japan. He has made significant contributions to the field of polymerizable compositions, particularly in applications related to solder resist materials. With a total of 5 patents to his name, Arioka's work has had a considerable impact on the industry.

Latest Patents

Arioka's latest patents include a polymerizable composition for solder resist and a solder resist pattern formation method. The polymerizable composition comprises an infrared ray shielding material, a polymerization initiator, and a polymerizable compound. This innovative approach enhances the effectiveness of solder resist applications. Additionally, his polymerizable composition includes a polymerization initiator, a polymerizable compound, a tungsten compound, and an alkali-soluble binder, showcasing his expertise in developing advanced materials.

Career Highlights

Throughout his career, Daisuke Arioka has worked with prominent companies such as Fujifilm Corporation and Fuji Photo Film Company, Limited. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking innovations in the field.

Collaborations

Arioka has collaborated with talented individuals in his field, including Kimi Ikeda and Kazuto Shimada. These partnerships have fostered a creative environment that has led to the development of innovative solutions in polymer technology.

Conclusion

Daisuke Arioka is a distinguished inventor whose work in polymerizable compositions has advanced the field of solder resist materials. His contributions, including 5 patents, reflect his commitment to innovation and excellence.

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