Fujifilm Corporation

Fuji Photo Film Company, Limited

Daisuke Arioka

Kimi Ikeda

Kazuto Shimada

Akinori Fujita

Yohsuke Takeuchi

Yoshiharu Yabuki

Naotsugu Muro

Naoto Yanagihara

Yuuichi Fukushige

Tetsunori Matsushita

Hideki Tomizawa

Kazumori Minami

Sachiko Arai

The present invention provides a polymerizable composition for a solder resist, including an infrared ray shielding material, a polymerization initiator, and a polymerizable compound, and a solder resist pattern forming method using the polymerizable composition for a solder resist.

Polymerizable composition for solder resist, and solder resist pattern formation method

A polymerizable composition includes: a polymerization initiator; a polymerizable compound; a tungsten compound; and an alkali-soluble binder.

Polymerizable composition

A photosensitive composition, at least containing: a carboxyl group-containing photosensitive polyurethane resin; a phosphorus-containing flame retardant; a polymerizable compound; and a photopolymerization initiator, wherein both a resin polymer of the photosensitive polyurethane resin and the polymerizable compound do not contain a phosphorus atom, wherein the photosensitive polyurethane resin has the weight average molecular weight from 2,000 to 60,000, the acid value from 20 mg KOH/g to 120 mg KOH/g, and the ethylenically unsaturated group equivalent from 0.05 mmol/g to 3.0 mmol/g, and wherein the photosensitive polyurethane resin has, in the side chain thereof, at least one particular functional group.

Photosensitive composition, photosensitive film, photosensitive laminate, method of forming a permanent pattern, and printed board

A heat-sensitive recording material including a substrate having disposed thereon a heat-sensitive recording layer containing a diazo compound and a coupler compound capable of reacting with the diazo compound to develop color,

Heat-sensitive recording material

Phenylurethane compounds of the following general formula (1); asymmetric urea compounds of the following general formula (10) obtained from the phenylurethane compounds; barbituric acid derivatives of general formula (18) produced from the asymmetric urea compounds, which have specific substituents and are useful in diazo thermal recording materials; and diazo thermal recording materials containing the barbituric acid derivative.

PHENYLURETHANE COMPOUNDS AND METHODS FOR PRODUCING SAME, ASYMMETRIC UREA COMPOUNDS AND METHODS FOR PRODUCING SAME, BARBITURIC ACID DERIVATIVE, AND DIAZO THERMAL RECORDING MATERIAL CONTAINING THE DERIVATIVE

Growing community of inventors

Shizuoka-ken, Japan

Daisuke Arioka