This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2017.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2017
Title: Dai-Wen Tang: Innovator in Advanced Patterning Processes
Introduction
Dai-Wen Tang is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of advanced patterning processes, particularly in the manufacturing of spacers. His innovative work has led to the development of methods that enhance profile control during etching processes.
Latest Patents
Dai-Wen Tang holds 1 patent for his invention titled "Methods for manufacturing a spacer with desired profile in an advanced patterning process." This patent provides apparatus and methods for performing an etching process on a spacer layer with good profile control in multiple patterning processes. The method involves conformally forming a spacer layer on a patterned structure and etching the spacer layer while forming an oxidation layer on it.
Career Highlights
Dai-Wen Tang is currently employed at Applied Materials, Inc., a leading company in the field of materials engineering. His work at Applied Materials has allowed him to push the boundaries of technology in semiconductor manufacturing.
Collaborations
Dai-Wen has collaborated with notable coworkers such as Hui Sun and Chung Liu. Their combined expertise has contributed to the success of various projects within the company.
Conclusion
Dai-Wen Tang's innovative approaches in advanced patterning processes have made a significant impact in the field of semiconductor manufacturing. His contributions continue to influence the industry and pave the way for future advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile