Company Filing History:
Years Active: 2000-2002
Title: The Innovations of Dag Lindquist
Introduction
Dag Lindquist is a notable inventor based in Penfield, NY, who has made significant contributions to the field of optical measurement systems. With a total of two patents to his name, Lindquist has developed innovative technologies that enhance precision in surface profiling and imaging.
Latest Patents
Lindquist's latest patents include a moiré interferometer with overlapping illumination and imaging systems. This invention features an illumination system and an imaging system that share a common focusing optic, which is preferably a concave mirror. The illumination system collimates light directed towards a test surface, while the imaging system telecentrically images a grating pattern on the test surface onto a fringe pattern detector.
Another significant patent is the automated optical surface profile measurement system. This fully automated system includes a loading chamber and a measurement chamber equipped with a phase differential laser optical scanning system. It features a five-axis positioner with a vacuum chuck for holding and orienting a wafer during surface profile measurement. The positioner allows for independent or compound motion of the wafer, accommodating various diameters through replaceable chucks. The system is controlled by a programmable CPU, enabling efficient operation and data management.
Career Highlights
Throughout his career, Dag Lindquist has worked with several companies, including Chapman Instruments, Inc. and Tropel Corporation. His experience in these organizations has contributed to his expertise in optical technologies and measurement systems.
Collaborations
Lindquist has collaborated with notable individuals in his field, including Silvio P Marchese-Ragona and Robert Bryant. These partnerships have likely fostered innovation and development in his projects.
Conclusion
Dag Lindquist's contributions to optical measurement technology through his patents demonstrate his commitment to innovation and precision. His work continues to influence the field and showcases the importance of advancements in measurement systems.
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