Company Filing History:
Years Active: 2015-2018
Title: The Innovations of Daewon Kwon: A Pioneer in Semiconductor Technology
Introduction
Daewon Kwon, an accomplished inventor based in Whippany, NJ, is known for his significant contributions to semiconductor fabrication. With a total of five patents to his name, Kwon is recognized for his innovative approaches in controlling stray radiation and dopant incorporation within chemical vapor deposition systems.
Latest Patents
One of Kwon's latest patents is titled "Control of stray radiation in a CVD chamber." This invention presents an apparatus and method designed to manage stray radiation within a chemical vapor deposition (CVD) chamber. The technology employs a heater array situated below a wafer carrier capable of radiatively heating the wafer carrier. Notably, the invention addresses issues of scattered radiation, employing mechanisms to minimize emission from designated heating elements. Furthermore, it highlights that strategically placing radiation thermometers can improve the accuracy of temperature readings.
Another significant patent by Kwon is the "Method and apparatus for controlled dopant incorporation and activation in a chemical vapor deposition system." This patent outlines systems and methods that enhance the production of semiconductor wafers with fewer point defects. It features a tunable ultraviolet (UV) light source that rasterizes a UV light beam across the surface of a semiconductor wafer during the epitaxial growth process, effectively dissociating point defects. The UV light source is designed to work externally to a Metal Organic Chemical Vapor Deposition (MOCVD) chamber, demonstrating Kwon's innovative thinking in integrating light technology with semiconductor processes.
Career Highlights
Daewon Kwon has built a career in the semiconductor industry, with notable affiliations at Veeco Instruments Inc. His experience at this leading firm equipped him with insights that contributed to several of his patented technologies. Kwon’s focus on enhancing CVD systems showcases his commitment to advancing semiconductor manufacturing techniques.
Collaborations
Throughout his career, Kwon collaborated with talented professionals, including his coworkers Jing Zhou and Guray Tas. Working alongside experts in the field, he has been able to refine his ideas and bring innovative concepts to fruition.
Conclusion
Daewon Kwon stands out as a pioneering inventor in the realm of semiconductor technology. His patents demonstrate a keen understanding of the complexities associated with CVD processes, highlighting his role in advancing this vital sector. With a continuous focus on innovation, Kwon is well-positioned to influence future developments in semiconductor fabrication.
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