Seoul, South Korea

Daehyun Kim

USPTO Granted Patents = 11 

 

Average Co-Inventor Count = 2.2

ph-index = 3

Forward Citations = 10(Granted Patents)


Location History:

  • Paju-si, KR (2020)
  • Seoul, KR (2012 - 2023)

Company Filing History:


Years Active: 2012-2025

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11 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Inventor Daehyun Kim

Introduction

Daehyun Kim, an accomplished inventor based in Seoul, South Korea, has made significant strides in the field of substrate treatment technology. With a total of 11 patents to his name, he has established himself as a notable figure in the industry, contributing innovative ideas and systems that enhance substrate processing efficiency.

Latest Patents

Among his latest patents is the "Substrate treating apparatus having edge impedance control circuit." This apparatus is designed to effectively treat substrates by employing a process chamber equipped with a gas supply unit and an RF power source. The device ingeniously features a support unit that includes an edge ring and a coupling ring with an electrode connected to an edge impedance control circuit. This circuit plays a crucial role in managing harmonics and controlling ion flux in the substrate's edge region.

Another significant patent by Kim is titled "Apparatus and method for treating substrate." This sophisticated system comprises a treatment chamber, a substrate support unit, and a plasma generation unit which utilizes RF power for generating plasma from the supplied gas. The heating unit ensures optimal substrate temperature control while the filter unit protects the system's performance by preventing RF power coupling with the heating member.

Career Highlights

Daehyun Kim has built a solid career in reputable companies, including Anapass Inc. and LG Display Co., Ltd. His expertise in developing cutting-edge treatment apparatus has been instrumental in improving substrate processing methodologies, reinforcing his status as a leading inventor in the technology sector.

Collaborations

Throughout his career, Kim has had the opportunity to collaborate with talented professionals in the field, including colleagues Tae Jin Kim and Jae Hun Lee. Together, they have facilitated advancements in substrate treatment technologies, underscoring the importance of teamwork in driving innovation.

Conclusion

Daehyun Kim's contributions to substrate treatment technologies through his numerous patents reflect a profound commitment to innovation and excellence. As he continues to develop new solutions, his work inspires the next generation of inventors and engineers to push the boundaries of technological advancement.

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