Anapass Inc.

Lg Display Co., Ltd.

Semes Co., Ltd.

Lg Electronics Inc.

Daehyun Kim

Tae Jin Kim

Sangho Cho

Jae Hun Lee

SangMoo Song

EunMi Jo

Inho Hwang

Yeongju Kim

JuneHo Park

Sun Joo Park

Saewon Na

Junyoung Huh

Seongsoo Hwang

Junyeob Lee

Youngmin Byoun

Jaewoong Eom

A substrate treating apparatus is disclosed. The apparatus includes a process chamber having a treating space defined therein, a support unit for supporting a substrate in the treating space, a gas supply unit for supplying process gas into the treating space, and an RF power source for supplying an RF signal to excite the process gas to a plasma state, wherein the support unit includes an edge ring surrounding the substrate, a coupling ring disposed below the edge ring and including an electrode therein, and an edge impedance control circuit connected to the electrode wherein the edge impedance control circuit includes a harmonics control circuit unit for controlling harmonics caused by the RF power source, and an ion flux control circuit unit for controlling an ion flux in an edge region of the substrate.

Substrate treating apparatus having edge impedance control circuit

A substrate treating apparatus includes a chamber having a treatment space therein, a substrate support unit that supports a substrate in the treatment space, a gas supply unit that supplies a gas into the treatment space, and a plasma generation unit including an RF power supply that applies RF power, wherein the plasma generation unit generates plasma from the gas using the RF power. The substrate support unit includes a support plate that supports the substrate and a heating unit that controls temperature of the substrate. The heating unit includes a heating member, a heater power supply that applies power to the heating member, and a filter unit that prevents coupling of the heating member and the RF power supply. The filter unit includes a filter that interrupts the RF power supplied from the RF power supply and a filter control unit that prevents degradation in performance of the filter.

Apparatus and method for treating substrate

An apparatus for treating a substrate includes a process chamber having a treatment space therein, a support unit that supports the substrate in the treatment space, a gas supply unit that supplies a process gas into the treatment space, an RF power supply that supplies an RF signal to excite the process gas into plasma, and a matching circuit connected between the RF power supply and the process chamber. The matching circuit includes an impedance matching device that performs impedance matching and a harmonic removal device that removes harmonics caused by the RF power supply. The matching circuit operates in a first mode when the harmonics caused by the RF power supply are sensed and in a second mode when the harmonics caused by the RF power supply are not sensed.

Disclosed are a tiled display and an optical compensation method thereof. The tiled display includes a color coordinate compensation circuit configured to convert color coordinates of pure color data to be displayed in display panels into target color coordinates having a color gamut smaller than a color gamut defined in color coordinates of each of display panels, and convert the pure color data into a data combination of two or more different colors.

Tiled display and optical compensation method thereof

A method of motion estimation includes obtaining motion vectors of blocks in a plurality of frames corresponding to a block to be motion estimated, determining whether the obtained motion vectors of the blocks are converged by comparing the obtained motion vectors of the blocks, calculating motion vector dispersity of adjacent blocks of the block to be motion estimated in a state in which the motion vectors are converged, and setting a size of a search range so as to correspond to the calculated motion vector dispersity of the adjacent blocks.

Method of motion estimation and image processing apparatus using the same

A fallback performing method including: calculating unreliability of a motion vector in a block included in a moving object in two frames classified in terms of time; calculating discontinuity of the motion vector for a predetermined time; calculating a fallback level from the unreliability and the discontinuity; and performing fallback based on the calculated fallback level.

Method of calculating discontinuity of motion vector and fallback performing method using the same

An organic light emitting display panel is provided that comprises a substrate comprising an emission area and a non-emission area; a black matrix disposed on the non-emission area and comprising at least one open area that exposes at least a portion of a pattern formed on the substrate, wherein the pattern or the exposed portion of the pattern comprises a multi-layer structure comprising a conductive layer and at least one low reflective layer.

Organic light emitting display panel comprising pixel repair region

A method of calculating discontinuity of a motion vector includes obtaining at least any one of a k-th projected forward motion vector by a forward motion vector of a block and a k-th projected backward motion vector by the forward motion vector and at least any one of a k-th projected forward motion vector by a backward motion vector and a k-th projected backward motion vector by the backward motion vector; obtaining inconsistency of forward motion vector to k-th frame projection and inconsistency of backward motion vector to k-th frame projection by calculating a first difference function using the obtained vectors, and calculating discontinuity using the inconsistency of forward motion vector to k-th frame projection and the inconsistency of backward motion vector to k-th frame projection.

Provided are a method for motion estimation and an apparatus for processing an image. The method includes extracting a pattern from any one frame, classifying the extracted pattern as any one of predetermined basic patterns, counting basic patterns of regions included in macroblocks according to types of the basic patterns to set representative basic patterns of the macroblocks, calculating at least one of a sum of absolute difference (SAD) term coefficient and a smoothness constraint (SC) term coefficient from a correlation between representative basic patterns of macroblocks included in a macroblock group, and calculating a cost function result using at least one of the calculated SAD term coefficient and SC term coefficient.

Method for motion estimation and apparatus for processing image

Provided are a method of detecting a transition area and an apparatus for processing an image using the same. The apparatus includes a line representative value calculator configured to calculate line representative values of an image including a non-image display area, an image display area, and a transition area interposed between the non-image display area and the image display area, and a transition area detector configured to calculate first-order and second-order differentiations of the line representative values, calculate a threshold value of the transition area using first-order and second-order-differentiation-representative-values of a first line group including a plurality of lines in a window including a plurality of lines and first-order and second-order-differentiation-representative-values of a second line group including a plurality of lines, and detect the transition area.

Method of detecting transition area and apparatus for processing image using the same

The present disclosure relates to the liquid crystal display device and the fabricating method thereof. The liquid crystal display device comprises: a first substrate including a ground line supplied with a ground voltage, and an extended ground line extending from the ground line, and attaching a first polarization plate; a second substrate joining to the first substrate with a sealant and attaching a second polarization plate; and a conductive upper-lower substrate connecting static electricity discharging path connecting to the extended ground line by forming at edges of the first polarization plate and the second polarization plate, and by intruding between the first and the second substrates.

Growing community of inventors

Seoul, South Korea

Daehyun Kim