Pyeongtaek, South Korea

Dae Hun Kim

This inventor holds 2 USPTO granted patents and 3 published patent applications. Top assignees: Semes Co., Ltd., Semes Co., Ltd.. Active years: 2025-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dae Hun Kim. Retrieved from https://idiyas.com/inventor/dae-hun-kim-b1abl37z

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 7.9

ph-index = 1


Company Filing History:


Years Active: 2025-2026

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2 patents (USPTO):Explore Patents

Title: Dae Hun Kim: Innovator in Substrate Processing Technology

Introduction: Dae Hun Kim is a notable inventor based in Pyeongtaek-si, South Korea. He has made significant contributions to the field of substrate processing, particularly through his innovative patent that addresses contamination issues in processing environments. His work is essential for enhancing the efficiency and reliability of substrate processing apparatuses.

Latest Patents: Dae Hun Kim holds a patent for a substrate processing apparatus and substrate processing method. This invention is designed to efficiently prevent contamination of a substrate and a processing space caused by a reverse flow of purge gas. This advancement is crucial for maintaining the integrity of substrates during processing.

Career Highlights: Dae Hun Kim is currently employed at Semes Co., Ltd., where he continues to develop and refine technologies related to substrate processing. His expertise and innovative mindset have positioned him as a valuable asset in his field.

Collaborations: Dae Hun Kim works alongside his coworker, Young Jin Kim, contributing to the advancement of substrate processing technologies. Their collaboration fosters a creative environment that encourages innovation and problem-solving.

Conclusion: Dae Hun Kim's contributions to substrate processing technology exemplify the impact of innovation in the industry. His patent addresses critical challenges in the field, showcasing his commitment to improving processing methods.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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