The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 27, 2025
Filed:
Mar. 27, 2023
Applicant:
Semes Co., Ltd., Cheonan-si, KR;
Inventors:
Do Hyung Kim, Chungcheongnam-do, KR;
Dae Hun Kim, Pyeongtaek-si, KR;
Young Jin Kim, Cheonan-si, KR;
Tae Ho Kang, Suwon-si, KR;
Young Joon Han, Cheonan-si, KR;
Eun Hyeok Choi, Cheonan-si, KR;
Jun Gwon Lee, Ulsan, KR;
Assignee:
SEMES CO., LTD., Cheonan-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 5/02 (2006.01); B08B 3/02 (2006.01); B08B 13/00 (2006.01); H01L 21/02 (2006.01); H01L 21/67 (2006.01); F26B 21/00 (2006.01);
U.S. Cl.
CPC ...
B08B 5/02 (2013.01); B08B 3/022 (2013.01); B08B 13/00 (2013.01); H01L 21/02057 (2013.01); H01L 21/0209 (2013.01); H01L 21/67051 (2013.01); F26B 21/004 (2013.01);
Abstract
Proposed are a substrate processing apparatus and a substrate processing method capable of efficiently preventing contamination of a substrate and a processing space caused by a reverse flow of purge gas.