The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 24, 2026
Filed:
Dec. 22, 2022
Semes Co., Ltd., Cheonan-si, KR;
Kun Hee Park, Gwangju, KR;
Young Joon Han, Cheonan-si, KR;
Cheol Hwan Jeong, Pyeongtaek-si, KR;
Dae Hun Kim, Pyeongtaek-si, KR;
Seong Hyun Yun, Seongnam-si, KR;
Ye Jin Choi, Seoul, KR;
Eun Hyeok Choi, Cheonan-si, KR;
Tae Ho Kang, Suwon-si, KR;
Young Jin Kim, Cheonan-si, KR;
Semes Co., Ltd., Cheonan-si, KR;
Abstract
An apparatus for treating a substrate of the present invention includes a buffer unit, an inversion unit, a first transfer chamber, a second transfer chamber, a first cleaning chamber, and a second cleaning chamber. The first transfer chamber, the inversion unit, and the second transfer chamber are sequentially arranged in one direction. The first cleaning chamber is disposed at one side of the first transfer chamber, and the second cleaning chamber is disposed at one side of the second transfer chamber. A first main transfer robot provided in the first transfer chamber directly transfers the substrate between the buffer unit, the inversion unit, and the first cleaning chamber. The second main transfer robot provided in the second transfer chamber directly transfers the substrate between the buffer unit, the inversion unit, and the second cleaning chamber.