Cheol Hwan Jeong

Title: Cheol Hwan Jeong: Innovator in Substrate Treatment Technologies

Introduction

Cheol Hwan Jeong is a notable inventor based in Pyeongtaek, South Korea. He has made significant contributions to the field of substrate treatment technologies, holding a total of 3 patents. His innovative approaches have advanced the efficiency and effectiveness of substrate processing.

Latest Patents

One of his latest patents is an "Apparatus and method for treating a substrate." This invention includes a buffer unit, an inversion unit, a first transfer chamber, a second transfer chamber, a first cleaning chamber, and a second cleaning chamber. The design allows for a sequential arrangement of the first transfer chamber, inversion unit, and second transfer chamber in one direction. The first cleaning chamber is positioned adjacent to the first transfer chamber, while the second cleaning chamber is located next to the second transfer chamber. The apparatus features a first main transfer robot in the first transfer chamber that directly transfers the substrate between the buffer unit, inversion unit, and first cleaning chamber. Additionally, a second main transfer robot in the second transfer chamber performs similar functions for the second cleaning chamber.

Another significant patent is the "Chuck pin assembly, and substrate holding apparatus and liquid processing apparatus including same." This invention consists of a body member on the circumferential portion of a chuck that supports a substrate and is designed to be movable with respect to the chuck. It includes a grip member that grips the lateral portion of the substrate and a rotational connection member that rotatably couples the grip member to the body member. This design allows for the grip member to rotate, preventing wear on the chuck pin at specific contact points with the substrate, thereby improving the lifespan of the chuck pin.

Career Highlights

Cheol Hwan Jeong has worked with Semes Co., Ltd., where he has applied his expertise in substrate treatment technologies. His work has contributed to the development of advanced processing equipment that enhances substrate handling and cleaning.

Collaborations

Throughout his career, Cheol Hwan Jeong has collaborated with notable professionals, including Seong Hyun Yun and Kun Hee Park. These collaborations have fostered innovation and the sharing of ideas in the field of substrate treatment.

Conclusion

Cheol Hwan Jeong is a distinguished inventor whose work in substrate treatment technologies has led to significant advancements in the industry.