Dae Heok Kwon

Title: Innovations of Dae Heok Kwon

Introduction

Dae Heok Kwon is a notable inventor based in Daejeon, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of five patents. His work focuses on methods that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

One of his latest patents is a method of cleaning a silicon nitride layer. This method effectively removes negatively charged impurities such as polymers and particles from the silicon nitride layer. By changing the zeta potential of the silicon nitride layer from positive to negative, the cleaning process utilizes a first solution selected from an alkali solution and an NC-2 solution. This approach allows for the easy removal of negatively charged impurities due to the repulsion force. Additionally, the substrate can be treated with a spin scrubber or quick dump rinse before and/or after changing the zeta potential. To achieve this change, the substrate can be dipped into a second solution, such as an SC-1 solution, an NC-2 solution, or an alkali solution.

Another significant patent by Kwon is related to shallow trench isolation. In this method, after forming a trench in a substrate, a polysilicon layer is deposited on the sidewalls and bottom of the trench. A thermal oxidation process is then performed to create a polysilicon oxide layer. A portion of this layer is removed to expose the polysilicon layer at the bottom of the trench while keeping the sidewalls covered. Subsequently, a TEOS-ozone oxide layer is deposited to fill the trench, enhancing the gap fill quality due to better deposition conditions at the bottom.

Career Highlights

Dae Heok Kwon has worked with prominent organizations such as the Korea Research Institute of Chemical Technology and Dongbu Electronics Co., Ltd. His experience in these institutions has allowed him to develop and refine his innovative techniques in semiconductor manufacturing.

Collaborations

Throughout his career, Kwon has collaborated with notable colleagues, including Hee Young Kim and Yong Mann Song. These collaborations have contributed to the advancement of technology in their respective fields.

Conclusion

Dae Heok Kwon's contributions to semiconductor technology through his innovative patents demonstrate his expertise and commitment to advancing the industry. His methods for cleaning silicon nitride layers and improving shallow trench isolation are significant advancements that enhance manufacturing processes