The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 17, 1995
Filed:
Apr. 28, 1993
Hee Y Kim, Daejeon, KR;
Yong M Song, Daejeon, KR;
Jong Y Jeon, Daejeon, KR;
Dae H Kwon, Daejeon, KR;
Kang M Lee, Daejeon, KR;
Jae S Lee, Daejeon, KR;
Dong S Park, Daejeon, KR;
Korea Research Institute of Chemical Technology, Daejeon, KR;
Abstract
An improved reactor for a high-temperature deposition reaction on seed particles is constructed with a fluidized bed which is divided into a heating zone and a reaction zone by a partition. Seed particles in the heating zone are fluidized by a carrier gas and are heated by microwaves. On the other hand, the reaction zone for the deposition reaction, through which reaction gases pass, is heated by particle mixing between the reaction zone and the upper section of the heating zone. Subsequently, a desired reaction temperature at the reaction zone is maintained stable without deteriorating the microwave heating of the heating zone.