Curtis R Olson

Title: Curtis R Olson: Innovator in Semiconductor Technology

Introduction

Curtis R Olson is a notable inventor based in Boise, ID (US), recognized for his contributions to semiconductor technology. He holds a total of 3 patents, focusing on methods to reduce damage during electron beam inspections of semiconductor substrates. His innovative approaches have significantly impacted the field of semiconductor manufacturing.

Latest Patents

Olson's latest patents include a "Method of reducing damage to an electron beam inspected semiconductor substrate" and "Method of reducing electron beam damage on post W-CMP wafers." These patents describe methods that utilize small chain organic solvents and non-neutral pH solutions to mitigate charge imbalances caused by electron beam inspections. Additionally, he explores the formation of passivation films on semiconductor substrates to further reduce damage during inspection processes.

Career Highlights

Throughout his career, Curtis has worked with prominent companies such as Micron Technology Incorporated and SCP Global Technologies, Inc. His experience in these organizations has allowed him to develop and refine his innovative techniques in semiconductor technology.

Collaborations

Some of his notable coworkers include David A Daycock and Paul A Morgan. Their collaboration has contributed to advancements in the semiconductor field.

Conclusion

Curtis R Olson's work in semiconductor technology exemplifies the importance of innovation in reducing damage during electron beam inspections. His patents and career achievements highlight his significant contributions to the industry.