The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 18, 2012
Filed:
Sep. 21, 2006
David A. Daycock, Boise, ID (US);
Paul A. Morgan, Kuna, ID (US);
Shawn D. Lyonsmith, Boise, ID (US);
Curtis R. Olson, Boise, ID (US);
David A. Daycock, Boise, ID (US);
Paul A. Morgan, Kuna, ID (US);
Shawn D. Lyonsmith, Boise, ID (US);
Curtis R. Olson, Boise, ID (US);
Micron Technology, Inc., Boise, ID (US);
Abstract
Methods for reducing electron beam induced damage on semiconductor substrates employ compositions such as small chain organic solvents and non-neutral pH solutions to reduce or eliminate charge imbalances on semiconductor substrates caused by electron beam inspection of the semiconductor substrates. Damage to semiconductor substrates by electron beam inspection processes may also be reduced by generating or otherwise forming passivation films on a semiconductor substrate following electron beam inspection.