Fremont, CA, United States of America

Craig Ranft


Average Co-Inventor Count = 6.0

ph-index = 4

Forward Citations = 363(Granted Patents)


Company Filing History:


Years Active: 2002-2003

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4 patents (USPTO):Explore Patents

Title: Innovations of Craig Ranft

Introduction

Craig Ranft is a notable inventor based in Fremont, CA (US), recognized for his contributions to semiconductor technology. He holds a total of 4 patents, showcasing his expertise in developing advanced systems and methods for semiconductor processing.

Latest Patents

One of his latest patents is titled "Systems and methods for two-sided etch of a semiconductor substrate." This invention involves a system and method for etching both sides of a semiconductor substrate. Reactive species are generated and directed toward the substrate for processing. A diverter is strategically positioned between the generation chamber and the substrate, allowing a portion of the reactive species to process the front of the substrate while another portion is diverted to the backside. Additionally, a flow restricter is placed between the substrate and the exhaust system to enhance the residence time of reactive species adjacent to the backside. Another significant patent is the "Downstream surface cleaning process," which provides systems and methods for selectively removing unwanted material from a semiconductor wafer's surface without damaging the underlying portions. This invention utilizes reactive species from a plasma source to effectively remove residues remaining after metal etching on a silicon wafer.

Career Highlights

Craig Ranft is currently employed at Mattson Technology, Inc., where he continues to innovate in the field of semiconductor technology. His work has significantly impacted the efficiency and effectiveness of semiconductor processing techniques.

Collaborations

Craig collaborates with talented individuals such as Robert Guerra and Rene George, contributing to a dynamic and innovative work environment.

Conclusion

Craig Ranft's contributions to semiconductor technology through his patents and collaborations highlight his role as a significant inventor in the field. His innovative approaches continue to advance the industry and improve semiconductor processing methods.

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