Craig M Gates

Title: Craig M Gates: Innovator in Organometallic Coatings

Introduction

Craig M Gates is a prominent inventor based in Corvallis, OR (US), known for his significant contributions to the field of organometallic coatings. With a total of 8 patents to his name, Gates has made strides in developing advanced materials for radiation patterning applications.

Latest Patents

One of Gates' latest patents focuses on "Organometallic radiation patternable coatings with low defectivity and corresponding methods." This invention addresses the formation of radiation patternable structures, particularly for extreme ultraviolet (EUV) patterning. The patent describes wafer structures that include a substrate with a smooth top surface and a radiation-sensitive organometallic coating. This coating has an average thickness of no more than 100 nm and maintains a defectivity of no more than about 1 defect per square centimeter, with a defect size greater than 48 nm, evaluated with a 3 mm edge exclusion. The methods outlined for creating this low defect coating involve spin coating a purified radiation-sensitive organometallic resist solution onto a wafer and drying it to achieve the desired properties.

Another notable patent by Gates involves "Monoalkyl tin trialkoxides and/or monoalkyl tin triamides with particulate contamination and corresponding methods." This patent details the purification processes for these compounds using fractional distillation and ultrafiltration. The purified compositions are essential for radiation-sensitive patterning applications. The fractional distillation process effectively removes metal impurities, while ultrafiltration is efficient in eliminating fine particulates. The patent also describes commercially practical processing techniques.

Career Highlights

Throughout his career, Craig M Gates has worked with notable companies, including Hewlett-Packard Development Company, L.P. and Inpria Corporation. His experience in these organizations has contributed to his expertise in the field of organometallic materials and their applications in advanced technology.

Collaborations

Gates has collaborated with several professionals in his field, including Benjamin L Clark and Dominick Smiddy. These collaborations have likely enhanced his research and development efforts, leading to innovative solutions in organometallic coatings.

Conclusion

Craig M Gates is a distinguished inventor whose work in organometallic coatings has advanced the field of radiation patterning. His patents reflect a commitment to innovation and excellence in material science.